JPH0224379B2 - - Google Patents

Info

Publication number
JPH0224379B2
JPH0224379B2 JP59028437A JP2843784A JPH0224379B2 JP H0224379 B2 JPH0224379 B2 JP H0224379B2 JP 59028437 A JP59028437 A JP 59028437A JP 2843784 A JP2843784 A JP 2843784A JP H0224379 B2 JPH0224379 B2 JP H0224379B2
Authority
JP
Japan
Prior art keywords
ring
holding
wafer
wafer ring
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59028437A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60173851A (ja
Inventor
Hisaya Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Mechatronics Co Ltd
Original Assignee
Toshiba Seiki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Seiki Co Ltd filed Critical Toshiba Seiki Co Ltd
Priority to JP2843784A priority Critical patent/JPS60173851A/ja
Publication of JPS60173851A publication Critical patent/JPS60173851A/ja
Publication of JPH0224379B2 publication Critical patent/JPH0224379B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67132Apparatus for placing on an insulating substrate, e.g. tape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Die Bonding (AREA)
JP2843784A 1984-02-20 1984-02-20 ペレツトボンデイング装置におけるウエハリング保持装置 Granted JPS60173851A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2843784A JPS60173851A (ja) 1984-02-20 1984-02-20 ペレツトボンデイング装置におけるウエハリング保持装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2843784A JPS60173851A (ja) 1984-02-20 1984-02-20 ペレツトボンデイング装置におけるウエハリング保持装置

Publications (2)

Publication Number Publication Date
JPS60173851A JPS60173851A (ja) 1985-09-07
JPH0224379B2 true JPH0224379B2 (en]) 1990-05-29

Family

ID=12248640

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2843784A Granted JPS60173851A (ja) 1984-02-20 1984-02-20 ペレツトボンデイング装置におけるウエハリング保持装置

Country Status (1)

Country Link
JP (1) JPS60173851A (en])

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4718593B2 (ja) * 2004-08-09 2011-07-06 リンナイ株式会社 1缶式複合熱源機
JP4894393B2 (ja) * 2006-07-25 2012-03-14 株式会社ノーリツ 熱源機

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS639375A (ja) * 1986-06-30 1988-01-16 Shoichi Tanaka 磁気記録再生装置

Also Published As

Publication number Publication date
JPS60173851A (ja) 1985-09-07

Similar Documents

Publication Publication Date Title
US5288663A (en) Method for extending wafer-supporting sheet
KR920004514B1 (ko) 반도체소자 제조장치
US6921457B2 (en) Semiconductor manufacturing apparatus, and positioning jig used for same
US5785225A (en) Frangible semiconductor wafer dicing apparatus which employs scribing and breaking
US6205994B1 (en) Scriber adapter plate
JPH0224379B2 (en])
US7430950B2 (en) Apparatus for cutting adhesive tape
JPH11162889A (ja) ウエハのブレーキング・延伸装置及び方法
US4838238A (en) Internal peripheral edge type blade holding device
JP3340151B2 (ja) ウエハー載置装置
JPH07122583A (ja) 半導体装置の製造方法及び半導体製造装置
JPS6329412B2 (en])
JPH03209744A (ja) ブレーキング装置及びこれを用いたブレーキング方法
JPS6134955A (ja) シリコンウエハ−の自動分離方法
US5035062A (en) Apparatus and method for aligning automated loading and unloading arms
CN219805959U (zh) 用于修正硅环平面度和平行度的夹具
JPH0526619B2 (en])
JPH0642496B2 (ja) ダイボンディング装置
JPH0248202Y2 (en])
JPH03208564A (ja) クランプ装置
JP2567395B2 (ja) 半導体素子製造装置
JP2660559B2 (ja) 半導体ウエーハ用トレイ
JP2025012274A (ja) 保持テーブル、保持方法、及び、エッジトリミング方法
JPH11240030A (ja) コンタクトレンズ材料の加工用治具からの取り外し方法およびその装置
GB2146557A (en) Centering device